Fast Simulation Of Temprature And Grain Growth In Directed Energy Deposition Additive Manufacturing

Abstract

In this paper, a fast simulation of grain growth during directed energy deposition is presented. Controlling the microstructure is indeed essential to obtain the desired macroscopic behavior. We present a fast macroscopic simulation of temperature accounting for grain growth. The proposed approach relies on the coupling of recent contributions presenting: (i) a simulation of temperature in DED, (ii) a mesoscopic model of grain growth model based on Orientated Tessellation Updating Method, and (iii) a macroscopic stochastic model of grain growth. The general strategy is to compute the temperature field as a function of time during the entire process. The initial crystallization is not addressed in this contribution, and an arbitrary initial microstructure are introduced to test the model. The stochastic evolution of the grain structure due to thermal cycling is computed, and the final grain structure statistics is obtained in the entire part. The proposed model is sufficiently fast to enable simulations of large parts and parametric studies or optimization loops can be performed to adjust process parameters.

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